Description

Applied Materials 0195‑01645 High‑Temperature Heater Assembly

Technical Specifications

• Part Number: 0195‑01645
• Brand: Applied Materials (AMAT, Semiconductor Process Equipment)
• Warranty: One Year
• Product Type: Ceramic resistive heater assembly for semiconductor vacuum chamber process station
• Rated Operating Voltage: 208 VAC single‑phase
• Power Rating: 3200 W nominal heating power
• Max Operating Temperature: 650 °C process working temperature
• Resistance Value: 13.5 Ω ±5 % cold resistance at 25 °C
• Insulation Material: High‑purity alumina ceramic insulator; metal alloy heating element
• Operating Temperature: Cabinet ambient: 0 °C ~ +55 °C; heater surface operational up to 650 °C
• Storage Temperature: ‑40 °C ~ +85 °C
• Interface: Multi‑pin high‑temperature compression terminal connectors; integrated thermocouple (K‑type) feed‑through for real‑time surface temperature monitoring
• Protection: High‑temperature mechanical stress relief structure; vacuum‑compatible out‑gassing controlled materials
• Mounting: Vacuum chamber internal fixture mounting; non‑atmospheric vacuum service environment
• Weight: approx 1.85 kg

Product Overview

The 0195‑01645 is a high‑performance ceramic resistive heater assembly designed for Applied Materials semiconductor vacuum processing chambers. It delivers precise high‑temperature thermal control for wafer processing stations. Integrated K‑type thermocouple provides closed‑loop temperature feedback to chamber process controller. The heater is built with low‑outgassing, vacuum‑grade materials to meet semiconductor fab cleanliness requirements, minimizing particle contamination inside high‑vacuum process environment. It is a critical consumable spare part for thin‑film deposition and etch process chambers.

This heater addresses semiconductor thermal‑processing challenges: stable high‑temperature uniform heating inside vacuum chamber, low‑particle vacuum‑compatible construction, drop‑in spare‑part compatibility for legacy AMAT chamber retrofit‑maintenance projects. Semiconductor equipment engineers, fab maintenance technicians and retrofit integrators benefit most. Typical applications: PVD, CVD, etch vacuum chamber substrate heating assemblies in semiconductor manufacturing fabs.

Key Application Notes

‑Vacuum‑chamber internal heater assembly; cannot operate standalone. Requires matched AC power controller, K‑type thermocouple monitoring unit and vacuum chamber mechanical fixture. ‑Strictly for high‑vacuum semiconductor chamber deployment; not suitable for atmospheric‑air continuous high‑temperature exposure. ‑Cold resistance reading shall be within 13.5 Ω ±5 % during incoming spare‑part inspection. ‑Not hot‑swap capable: full chamber vent‑down, power cut‑off and sufficient cool‑down period are mandatory before heater replacement. ‑Original OEM production active; aftermarket surplus/refurbished spare parts are circulating for legacy chamber maintenance. ‑Follow Applied Materials 0195‑01645 service manual for torque values, thermocouple wiring and chamber bake‑out procedure after installation.